Aprio contributes DFM technology to Si2
This agrrement is thought to contribute lithography process modeling and simulation technology to Si2's Design to Manufacturing Coalition (DTMC).
"Since lithography is unique to a fab's target process, and the data required by each tool in the design flow may be different, several players in the industry have called for an open lithography process interface to ensure that complete and accurate data is passed throughout the entire design flow.
By standardizing the interface between IC design creation/analysis tools and lithography modeling and simulation tools, better litho-aware solutions can be quickly added to the IC design and analysis flows.
By using Si2's OpenAccess standard, it was able to establish robust interfaces with DFM partners Ponte Solutions Inc. and Pyxis Technology.
A set of "DFM views" are produced by Aprio's Halo-Quest silicon image simulation and analysis tool. Pyxis and Ponte access these views via the OpenAccess interface to enable a new generation of silicon-aware design applicatiions."
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